CVD 장비
TCVD-DC100CA
Premium Custom Design Dual CVD System with a Glove Box
Chemical vapor deposition (CVD) system for the syntheses of 2D materials at scales from a chip to a wafer,
including the synthesis of graphene, h-BN, TMDCs on various substrates by use of gas-phase or solid precursors
and metal-organic (MO) sources. The glove box enables the synthesis of various air-sensitive TMDCs.
Chemical vapor deposition (CVD) system for the syntheses of 2D materials at scales from a chip to a wafer,
including the synthesis of graphene, h-BN, TMDCs on various substrates by use of gas-phase or solid precursors
and metal-organic (MO) sources. The glove box enables the synthesis of various air-sensitive TMDCs.
Thermal Chemical Vapor Deposition
열화학증착(TCVD)기술의 주요 사항은 기판 위에 얇은 필름이 합성되는 고압의 reactor로
1,000ºC 가량의 고온에서 가스들을 유입시키는 것입니다.
Size
3000 (W) x 1800 (H) x 750 (D)
특징
Size (mm): 3000 (W) x 1800 (H) x 750 (D)
Up to 10 gases and 3 MO sources for gas-phase synthesis.
Motor-controlled movable heater for fast heating and cooling (patented).
Fully computer-controlled programmable recipes.
TCVD100 platform: Proven performance for ~150 systems for more than 10 years.
Invited training for full sample preparation processes from synthesis, etching, and transfer.
Supply of high-quality source materials.
1 year warranty included (2 year extended).
CVD chambers connected to a Glove Box. Free from air exposure.
Up to 10 gases and 3 MO sources for gas-phase synthesis.
Motor-controlled movable heater for fast heating and cooling (patented).
Fully computer-controlled programmable recipes.
TCVD100 platform: Proven performance for ~150 systems for more than 10 years.
Invited training for full sample preparation processes from synthesis, etching, and transfer.
Supply of high-quality source materials.
1 year warranty included (2 year extended).
CVD chambers connected to a Glove Box. Free from air exposure.
기술사양(표준)
| Reactor |
Tube type 4 inch diameter quartz. Connected to a glove box. |
|---|---|
| Substrate Size |
Lateral insertion of 10 mm to < 4 inch wafers possible (Loading frames for small samples). Rolled metallic foils can be loaded to synthesize A4 sized or larger 2D materials. |
| Furnace |
Dual-zone heater and controller for graphene/h-BN synthesis. Single-zone precursor heater and Dual-zone deposition heater for TMDC synthesis. The heaters are movable along two rails and the distance can be motor-controlled. Remote RF Plasma Module. |
| Base Pressure | 10⁻⁵ mbar (depending on the dryness of source). |
| Operating Pressure | 10⁻³ mbar ~ 1 bar |
| Precursor |
Max 10 gas lines (ex. CH₄, B₂H₆, Ar, H₂, O₂, etc.) Metal oxide sources of various transition metals placed in Heat Zone 1 for solid source growth. |
| Other metal organic (MO) sources | Extra 3 metal-organic source injection ports are included. (ex Mo(CO)₆, Fe(CO)₅) |
| Flow control |
Precursor gases: 0.1 ~ 10 sccm Other gases: 10 ~ 1000 sccm Automatic flow control. |
| Vacuum |
Cold trap for residual sources. Turbo pump 450 l/s (ISO160) < 10⁻⁶ mbar. Dry scroll pump < 10⁻¹ mbar. Main gate valve pneumatic type / fore-line / roughing angle valve / foamed bellows. By-pass pumping adaptor, clamp & centering. |
| System Control |
Control PC system. Serial network module. Remote IO Module. System base programming / System recipe control module / System date file save module. Software upgrade support. |
구매 고객 리스트
| Seoul National University Graphene Research Center | Israel Institute of Technology |
| Duke University |
품질보증
그래핀 스퀘어에서는 장비를 구매하신 고객분들께 전체 부속품 (단 quartz 유리 및 고무 오링 제외)에 대한 1년 무상 워런티 서비스를 제공합니다.
기간 내에 사용하시는 장비에서 부품 이상 또는 시스템 오류 발견시 바로 연락 주시면 즉각 24시 이내에 수리기사를 파견하여 드립니다.
기간 내에 사용하시는 장비에서 부품 이상 또는 시스템 오류 발견시 바로 연락 주시면 즉각 24시 이내에 수리기사를 파견하여 드립니다.
배송 기간
제작 완료 및 검수 공정을 통과한 모든 장비는 고객님께서 지정해주신 장소로 당일배송 드립니다.
장비 구매 과정
01
견적 요청
견적 요청 및 견적서 제공
02
구매의사 확인
고객의 구매의사 확인 (고객으로부터 Purchase order 전달)
03
Invoice / Payment
Invoice 및 Payment 자료 제공
04
제작 / Training Program 제공
1차 입금 완료 시 기계 제작 돌입 및 Training Program 제공
05
장비 동작Test / 제품포장, 발송
제작 완료 후 최종 테스트 통과 시 제품 포장 및 발송 진행
06
도착 완료
최대 4일 이내 고객 사이트에 도착 완료