Thermal Chemical Vapor Deposition
The main Thermal CVD technology involves adding gases to the pressurized reactor at high
temperature of about 1,000℃ where thin film is synthesized onto substrates.
Size
1750(W) X 1585(H) X 750(D)
Features
Size(mm): 1750(W) x 1585(H) x 750(D)
Advanced Semi-Auto System
Optimized for graphene, CNT growth
Water-cooled end chambers doors.
Process Temperature: ~1,100℃
Uniformity of Film Thickness: ≤+-3%
Testing Uniformity: ≤+-3%
Movable furnace method is our unique knowhow for fast heating
fast cooling of the sample
Standard safety box
* Price will be determined after consultation. (Different customization from the standard parts will affect the overall price.)
Specifications
Thermal CVD Semi-auto Operation system
End chambers (stainless steel) - water cooled system
Gas control unit ( Mass flow controller) - 3channel standard + 1 spare
340liter/min Oil rotary pump
Pneumatic On/off valve with Down stream Auto pressure control Throttle valve with controller
Programmable Temperature controller
High Temperature Furnace(Max1200℃)
Rapid Cooling system by furnace moving
Atmospheric and Vacuum Processing
Anti-contamination system by inner tube
Vacuum gauge unit(Capacitance/Convectron)
1 year warranty
On-site install and training
Safety Cover (Connected exhaust system)
Safety interlock system(Water / Air)
Options
Max temp 1500℃ Furnace by SIC source
Rapid thermal processing furnace by IR lamp source
MF power induction heating process Max temp 1600℃
MFC(Mass flow controller) addition total 12channel
Dry vacuum pump ( Scroll / booster / industry)
Gas Safety interlock system for gas leak
RF plasma ( ICP type )
Tungsten filament gas source cracking
Additional Furnace for source evaporation
High Vacuum processing option (Pump/Gauge/valve unit)
Installation in Fume hood
Source delivery system ( Bubbler / Gas / Solid )
System Utility ( Chiller / scrubber / gas cabinet )
System Program ( Auto processing system)
Consumable Parts
K-type Thermocouple (Option : R-type)
Furnace heating element (Furnace repair)
Vacuum sensor
Oil in Rotary Oil Pump
O-ring
Quartz tube
Facility Requirements
Electrical power |
220VAC 1ph 30A (35A for +1 furnace) |
Compressed air |
0.5~0.6Mpa |
Compressed air input size |
6 mm one touch fitting |
Cooling water in/out |
3/8" lok fitting |
Cooling water pressure |
0.1~0.2Mpa |
Safety exhaust size |
6 mm one touch tube |
Gas input pressure |
40psi |
Gas port |
4ch standard (Option 2ch Extension) |
Gas port size |
1/4"lok fitting |
Pump exhaust |
NW25 |
Rotary pump capacity |
340liter/min |
Vent |
1/4"lok fitting |
Customer List
| Micro Photonics |
Harvard University |
| KAUST |
Oxford University |
| NTNU Nano Lab |
University of Texas |
| CNR IMIP of Bari University Lab |
Cambridge University Lab |
| FHNW |
Tech University of Korea |
| Israel |
GIST |